Treatment | TCI method A 1,375/A 2,900 | LOI method H 1,429/H 898 | DP w |
---|---|---|---|
Control | 0.4013 (0.0247) | 1.598 (0.035) | 1,033 (0.2) |
9 % MC, 150 °C | 0.1075 (0.0084) | 1.471 (0.095) | 842 (0.5) |
9 % MC, 200 °C | 0.3521 (0.0262) | 1.638 (0.062) | 769 (1.1) |
9 % MC, 250 °C | 0.4333 (0.1019) | 2.314 (0.207) | 614 (0.1) |
0 % MC, 150 °C | 0.3482 (0.0241) | 1.627 (0.051) | 893 (3.8) |
0 % MC, 200 °C | 0.3398 (0.0177) | 1.590 (0.136) | 703 (3.9) |
0 % MC, 250 °C | 0.3537 (0.0340) | 1.736 (0.253) | 607 (0.1) |